DRY ETCHING DEVICE

PURPOSE:To generate stable plasma, and to enable uniform dry etching by blowing off a reaction gas from the whole surface of one electrode surface of parallel plate electrodes, on the whole surfaces thereof field strength is equalized, and uniformly passing the reaction gas through the other electrode. CONSTITUTION:A high-frequency electrode 2 and a grounding electrode 3 are opposed in parallel and mounted in a vacuum vessel 1 with an exhaust port 13 connected to a vacuum pump 18. A high-frequency power supply 5 is connected to the electrode 2 while a reaction gas is introduced from the outside through an introducing hole 12, and the reaction gas is blown off from the whole surface of the lower surface of the electrode. The reaction gas is activated by high-frequency power applied to the electrode 2 and changed into a uniform stable plasma state, and collides with a printed substrate 7 and dry-etch the substrate, and is discharged equally to the lower baffle 17 side.