VAPOR DEPOSITION METHOD ON FILM

PURPOSE:To solve problems during vapor deposition on a polyether sulfone or polysulfone film due to the properties of the film by superposing a film contg. little volatile matter on the polysulfone film before vapor deposition. CONSTITUTION:A film 9 contg. little volatile matter is superposed on a polyether sulfone or polysulfone film 8, and the resulting laminated film 4 is sent to the lower part of a cooling drum 2 from an unwinder 1 through a suitable guide roll 5. A metal, a metallic oxide or the like evaporated from a vapor deposition source 7 is deposited on the filmlike substrate 8, and the film 4 is wound around a winder 3 through a guide roll 6. Since the film 9 has high lubricity and superior blocking resistance, the film 4 is not creased during winding, and the vapor-deposited film does not stick to the film 9 even after rewinding.