EXPOSURE METHOD

PURPOSE:To prevent the synergistic error of transferred images due to a superposing exposure from generating by a method wherein the exposure is performed using a mask formed with patterns having been given a compensation equivalent to the optical distortion of an optical system, by which the patterns are exposed and transferred, so that the distortion of each pattern due to the optical distortion peculiar to each optical system, by which the pattern is exposed and transferred, is dissolved. CONSTITUTION:Gauge patterns with reticular patterns formed previously with high precision are exposed and transferred by each exposing device, and by comparing each of the transferred patterns with the gauge patterns, the distortion of every each exposing device is quantitatively measured. When a mask, which is formed with desired patterns, is formed, the desired patterns are compensated so that the distortion of the patterns is dissolved with the measured value of distortion of an exposing device, by which the patterns are exposed and transferred. For example, the compensation can be easily realized by a way that measured value data of distortion of exposing devices are inputted in the drawing signal generation control part of an optical pattern generator and an electron ray drawing device and the drawing signal makes a fine adjustment. That is, when such compensated patterns 10 as indicated by broken lines in the diagram are formed, such transferred images of proper patterns 1 as shown by imaginary lines (two dotted broken lines) result in to be secured.