PHOTOSENSITIVE COMPOSITION
PURPOSE:To obtain a photosensitive composition which can be developed with an developer and gives an image having superior printing resistance by using a photosensitive diazo compound and a water-swellable resin having polymerizable ethylenic unsatd. groups and tertiary nitrogen atoms. CONSTITUTION:...
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| creator | SAKAGUCHI NORIHISA SUWA TAKAAKI |
| description | PURPOSE:To obtain a photosensitive composition which can be developed with an developer and gives an image having superior printing resistance by using a photosensitive diazo compound and a water-swellable resin having polymerizable ethylenic unsatd. groups and tertiary nitrogen atoms. CONSTITUTION:A water-swellable resin having at least one polymerizable ethylenic unsatd. group and tertiary nitrogen atoms in the molecule is manufactured by reacting epoxy resin with a primary amine such as n-butylamine and a vinyl monomer having an epoxy group such as glycidyl acrylate. The water-swellable resin is mixed with a photosensitive diazo compound such as a condensation product of p-diazodiphenylamine with p-formaldehyde in 2:5-5:2 weight ratio to obtain the desired photosensitive composition. This photosensitive composition is suitable for use in the manufacture of a photosensitive lithographic printing plate. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPS60158439A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPS60158439A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPS60158439A3</originalsourceid><addsrcrecordid>eNrjZJAK8PAP8Q929Qv2DPEMc1Vw9vcN8Aex_f14GFjTEnOKU3mhNDeDoptriLOHbmpBfnxqcUFicmpeakm8V0CwmYGhqYWJsaWjMTFqAG4EIRk</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PHOTOSENSITIVE COMPOSITION</title><source>esp@cenet</source><creator>SAKAGUCHI NORIHISA ; SUWA TAKAAKI</creator><creatorcontrib>SAKAGUCHI NORIHISA ; SUWA TAKAAKI</creatorcontrib><description>PURPOSE:To obtain a photosensitive composition which can be developed with an developer and gives an image having superior printing resistance by using a photosensitive diazo compound and a water-swellable resin having polymerizable ethylenic unsatd. groups and tertiary nitrogen atoms. CONSTITUTION:A water-swellable resin having at least one polymerizable ethylenic unsatd. group and tertiary nitrogen atoms in the molecule is manufactured by reacting epoxy resin with a primary amine such as n-butylamine and a vinyl monomer having an epoxy group such as glycidyl acrylate. The water-swellable resin is mixed with a photosensitive diazo compound such as a condensation product of p-diazodiphenylamine with p-formaldehyde in 2:5-5:2 weight ratio to obtain the desired photosensitive composition. This photosensitive composition is suitable for use in the manufacture of a photosensitive lithographic printing plate.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; AUXILIARY PROCESSES IN PHOTOGRAPHY ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES ; PHYSICS</subject><creationdate>1985</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19850819&DB=EPODOC&CC=JP&NR=S60158439A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19850819&DB=EPODOC&CC=JP&NR=S60158439A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SAKAGUCHI NORIHISA</creatorcontrib><creatorcontrib>SUWA TAKAAKI</creatorcontrib><title>PHOTOSENSITIVE COMPOSITION</title><description>PURPOSE:To obtain a photosensitive composition which can be developed with an developer and gives an image having superior printing resistance by using a photosensitive diazo compound and a water-swellable resin having polymerizable ethylenic unsatd. groups and tertiary nitrogen atoms. CONSTITUTION:A water-swellable resin having at least one polymerizable ethylenic unsatd. group and tertiary nitrogen atoms in the molecule is manufactured by reacting epoxy resin with a primary amine such as n-butylamine and a vinyl monomer having an epoxy group such as glycidyl acrylate. The water-swellable resin is mixed with a photosensitive diazo compound such as a condensation product of p-diazodiphenylamine with p-formaldehyde in 2:5-5:2 weight ratio to obtain the desired photosensitive composition. This photosensitive composition is suitable for use in the manufacture of a photosensitive lithographic printing plate.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>AUXILIARY PROCESSES IN PHOTOGRAPHY</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1985</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJAK8PAP8Q929Qv2DPEMc1Vw9vcN8Aex_f14GFjTEnOKU3mhNDeDoptriLOHbmpBfnxqcUFicmpeakm8V0CwmYGhqYWJsaWjMTFqAG4EIRk</recordid><startdate>19850819</startdate><enddate>19850819</enddate><creator>SAKAGUCHI NORIHISA</creator><creator>SUWA TAKAAKI</creator><scope>EVB</scope></search><sort><creationdate>19850819</creationdate><title>PHOTOSENSITIVE COMPOSITION</title><author>SAKAGUCHI NORIHISA ; SUWA TAKAAKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS60158439A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1985</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>AUXILIARY PROCESSES IN PHOTOGRAPHY</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>SAKAGUCHI NORIHISA</creatorcontrib><creatorcontrib>SUWA TAKAAKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SAKAGUCHI NORIHISA</au><au>SUWA TAKAAKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOSENSITIVE COMPOSITION</title><date>1985-08-19</date><risdate>1985</risdate><abstract>PURPOSE:To obtain a photosensitive composition which can be developed with an developer and gives an image having superior printing resistance by using a photosensitive diazo compound and a water-swellable resin having polymerizable ethylenic unsatd. groups and tertiary nitrogen atoms. CONSTITUTION:A water-swellable resin having at least one polymerizable ethylenic unsatd. group and tertiary nitrogen atoms in the molecule is manufactured by reacting epoxy resin with a primary amine such as n-butylamine and a vinyl monomer having an epoxy group such as glycidyl acrylate. The water-swellable resin is mixed with a photosensitive diazo compound such as a condensation product of p-diazodiphenylamine with p-formaldehyde in 2:5-5:2 weight ratio to obtain the desired photosensitive composition. This photosensitive composition is suitable for use in the manufacture of a photosensitive lithographic printing plate.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS |
| title | PHOTOSENSITIVE COMPOSITION |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-04T12%3A20%3A54IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SAKAGUCHI%20NORIHISA&rft.date=1985-08-19&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJPS60158439A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |