PHOTOSENSITIVE COMPOSITION

PURPOSE:To obtain a photosensitive composition which can be developed with an developer and gives an image having superior printing resistance by using a photosensitive diazo compound and a water-swellable resin having polymerizable ethylenic unsatd. groups and tertiary nitrogen atoms. CONSTITUTION:...

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Bibliographische Detailangaben
Hauptverfasser:	SAKAGUCHI NORIHISA, SUWA TAKAAKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS
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Beschreibung
Zusammenfassung:	PURPOSE:To obtain a photosensitive composition which can be developed with an developer and gives an image having superior printing resistance by using a photosensitive diazo compound and a water-swellable resin having polymerizable ethylenic unsatd. groups and tertiary nitrogen atoms. CONSTITUTION:A water-swellable resin having at least one polymerizable ethylenic unsatd. group and tertiary nitrogen atoms in the molecule is manufactured by reacting epoxy resin with a primary amine such as n-butylamine and a vinyl monomer having an epoxy group such as glycidyl acrylate. The water-swellable resin is mixed with a photosensitive diazo compound such as a condensation product of p-diazodiphenylamine with p-formaldehyde in 2:5-5:2 weight ratio to obtain the desired photosensitive composition. This photosensitive composition is suitable for use in the manufacture of a photosensitive lithographic printing plate.