EVAPORATING SOURCE DEVICE HAVING DIRECTIVITY IN OBLIQUE DIRECTION

PURPOSE:To carry out vapor deposition independently of the placement and shape of a substrate by tilting and rotating a vessel so as to generate vapor distributed at high density in an oblique direction by the evaporation of a material to be evaporated from the evaporating outlet of the vessel tilte...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	KOMIYA MUNEHARU
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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