METHOD AND APPARATUS FOR EXPOSURE

PURPOSE:To secure highly accurate position alignment, by removing only the resist which is applied to a target pattern part before the alignment work. CONSTITUTION:An exposure light beam 24 is transmitted through an optical fiber 16 and projected on a resist 9 on a target pattern 7 through a lens 17...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KADOTA KAZUYA, NAGAO MAKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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