JPS596504B

PURPOSE:To save the number of element production steps by making a mask capable of displaying the positions where chips are cut out irrespective of the quantities of chips on a wafer.

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Bibliographische Detailangaben
Hauptverfasser:	MATSUDA YASUMASA, NISHIHARA MOTOHISA, INOE MAMORU, SHIMADA SATOSHI, YAMADA KAZUJI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE:To save the number of element production steps by making a mask capable of displaying the positions where chips are cut out irrespective of the quantities of chips on a wafer.