ELECTRON BEAM TRANSFER DEVICE
PURPOSE:To obtain the titled device of high transfer accuracy by constructing the transfer device of an exfoliating chamber for exfoliating a photoelectric film from the photoelectric surface of a photoelectric mask, a coating chamber coating the photoelectric surface with the photoelectric film and...
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| creator | TOUJIYOU TOORU SHINOZAKI TOSHIAKI SUGIHARA KAZUYOSHI MORI ICHIROU |
| description | PURPOSE:To obtain the titled device of high transfer accuracy by constructing the transfer device of an exfoliating chamber for exfoliating a photoelectric film from the photoelectric surface of a photoelectric mask, a coating chamber coating the photoelectric surface with the photoelectric film and a conveyor conveying the photoelectric mask to a transfer chamber without exposing the mask to atmospheric air. CONSTITUTION:A reserve chamber 22 divided by a valve 24 up and down is connected to one side wall of a vacuum vessel 1 as the transfer chamber through a gate valve 21. The upper chamber of the chamber 22 is used as a mask reserve chamber 26, a lower chamber is used as a sample reserve chamber 25, a magazine 27 encasing a plurality of samples 3 is disposed in the chamber 25, and a magazine 28 encasing a plurality of the photoelectric masks 5 is disposed in the chamber 26. The coating chamber 34 is connected to the reserve chamber 22 through a valve 33, and the desired photoelectric surfaces are formed to the exposed surfaces of the samples 3 coated with the masks 5 by an evaporating mechanism 37 provided in the chamber 34. The samples 3 are transferred to the exfoliating chamber (not shown) without being exposed to air, and the samples 3 and the masks 5 are exfoliated in the exfoliating chamber. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPS5946028A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPS5946028A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPS5946028A3</originalsourceid><addsrcrecordid>eNrjZJB19XF1Dgny91NwcnX0VQgJcvQLdnMNUnBxDfN0duVhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfFeAcGmliZmBkYWjsZEKAEATyUg5A</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ELECTRON BEAM TRANSFER DEVICE</title><source>esp@cenet</source><creator>TOUJIYOU TOORU ; SHINOZAKI TOSHIAKI ; SUGIHARA KAZUYOSHI ; MORI ICHIROU</creator><creatorcontrib>TOUJIYOU TOORU ; SHINOZAKI TOSHIAKI ; SUGIHARA KAZUYOSHI ; MORI ICHIROU</creatorcontrib><description>PURPOSE:To obtain the titled device of high transfer accuracy by constructing the transfer device of an exfoliating chamber for exfoliating a photoelectric film from the photoelectric surface of a photoelectric mask, a coating chamber coating the photoelectric surface with the photoelectric film and a conveyor conveying the photoelectric mask to a transfer chamber without exposing the mask to atmospheric air. CONSTITUTION:A reserve chamber 22 divided by a valve 24 up and down is connected to one side wall of a vacuum vessel 1 as the transfer chamber through a gate valve 21. The upper chamber of the chamber 22 is used as a mask reserve chamber 26, a lower chamber is used as a sample reserve chamber 25, a magazine 27 encasing a plurality of samples 3 is disposed in the chamber 25, and a magazine 28 encasing a plurality of the photoelectric masks 5 is disposed in the chamber 26. The coating chamber 34 is connected to the reserve chamber 22 through a valve 33, and the desired photoelectric surfaces are formed to the exposed surfaces of the samples 3 coated with the masks 5 by an evaporating mechanism 37 provided in the chamber 34. The samples 3 are transferred to the exfoliating chamber (not shown) without being exposed to air, and the samples 3 and the masks 5 are exfoliated in the exfoliating chamber.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES ; MATERIALS THEREFOR ; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES ; NANOTECHNOLOGY ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES ; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES ; TRANSPORTING</subject><creationdate>1984</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19840315&DB=EPODOC&CC=JP&NR=S5946028A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19840315&DB=EPODOC&CC=JP&NR=S5946028A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TOUJIYOU TOORU</creatorcontrib><creatorcontrib>SHINOZAKI TOSHIAKI</creatorcontrib><creatorcontrib>SUGIHARA KAZUYOSHI</creatorcontrib><creatorcontrib>MORI ICHIROU</creatorcontrib><title>ELECTRON BEAM TRANSFER DEVICE</title><description>PURPOSE:To obtain the titled device of high transfer accuracy by constructing the transfer device of an exfoliating chamber for exfoliating a photoelectric film from the photoelectric surface of a photoelectric mask, a coating chamber coating the photoelectric surface with the photoelectric film and a conveyor conveying the photoelectric mask to a transfer chamber without exposing the mask to atmospheric air. CONSTITUTION:A reserve chamber 22 divided by a valve 24 up and down is connected to one side wall of a vacuum vessel 1 as the transfer chamber through a gate valve 21. The upper chamber of the chamber 22 is used as a mask reserve chamber 26, a lower chamber is used as a sample reserve chamber 25, a magazine 27 encasing a plurality of samples 3 is disposed in the chamber 25, and a magazine 28 encasing a plurality of the photoelectric masks 5 is disposed in the chamber 26. The coating chamber 34 is connected to the reserve chamber 22 through a valve 33, and the desired photoelectric surfaces are formed to the exposed surfaces of the samples 3 coated with the masks 5 by an evaporating mechanism 37 provided in the chamber 34. The samples 3 are transferred to the exfoliating chamber (not shown) without being exposed to air, and the samples 3 and the masks 5 are exfoliated in the exfoliating chamber.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MANUFACTURE OR TREATMENT OF NANOSTRUCTURES</subject><subject>MATERIALS THEREFOR</subject><subject>MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES</subject><subject>NANOTECHNOLOGY</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1984</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJB19XF1Dgny91NwcnX0VQgJcvQLdnMNUnBxDfN0duVhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfFeAcGmliZmBkYWjsZEKAEATyUg5A</recordid><startdate>19840315</startdate><enddate>19840315</enddate><creator>TOUJIYOU TOORU</creator><creator>SHINOZAKI TOSHIAKI</creator><creator>SUGIHARA KAZUYOSHI</creator><creator>MORI ICHIROU</creator><scope>EVB</scope></search><sort><creationdate>19840315</creationdate><title>ELECTRON BEAM TRANSFER DEVICE</title><author>TOUJIYOU TOORU ; SHINOZAKI TOSHIAKI ; SUGIHARA KAZUYOSHI ; MORI ICHIROU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS5946028A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1984</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MANUFACTURE OR TREATMENT OF NANOSTRUCTURES</topic><topic>MATERIALS THEREFOR</topic><topic>MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES</topic><topic>NANOTECHNOLOGY</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>TOUJIYOU TOORU</creatorcontrib><creatorcontrib>SHINOZAKI TOSHIAKI</creatorcontrib><creatorcontrib>SUGIHARA KAZUYOSHI</creatorcontrib><creatorcontrib>MORI ICHIROU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TOUJIYOU TOORU</au><au>SHINOZAKI TOSHIAKI</au><au>SUGIHARA KAZUYOSHI</au><au>MORI ICHIROU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ELECTRON BEAM TRANSFER DEVICE</title><date>1984-03-15</date><risdate>1984</risdate><abstract>PURPOSE:To obtain the titled device of high transfer accuracy by constructing the transfer device of an exfoliating chamber for exfoliating a photoelectric film from the photoelectric surface of a photoelectric mask, a coating chamber coating the photoelectric surface with the photoelectric film and a conveyor conveying the photoelectric mask to a transfer chamber without exposing the mask to atmospheric air. CONSTITUTION:A reserve chamber 22 divided by a valve 24 up and down is connected to one side wall of a vacuum vessel 1 as the transfer chamber through a gate valve 21. The upper chamber of the chamber 22 is used as a mask reserve chamber 26, a lower chamber is used as a sample reserve chamber 25, a magazine 27 encasing a plurality of samples 3 is disposed in the chamber 25, and a magazine 28 encasing a plurality of the photoelectric masks 5 is disposed in the chamber 26. The coating chamber 34 is connected to the reserve chamber 22 through a valve 33, and the desired photoelectric surfaces are formed to the exposed surfaces of the samples 3 coated with the masks 5 by an evaporating mechanism 37 provided in the chamber 34. The samples 3 are transferred to the exfoliating chamber (not shown) without being exposed to air, and the samples 3 and the masks 5 are exfoliated in the exfoliating chamber.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS THEREFOR MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES NANOTECHNOLOGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING |
| title | ELECTRON BEAM TRANSFER DEVICE |
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