ELECTRON BEAM TRANSFER DEVICE

PURPOSE:To obtain the titled device of high transfer accuracy by constructing the transfer device of an exfoliating chamber for exfoliating a photoelectric film from the photoelectric surface of a photoelectric mask, a coating chamber coating the photoelectric surface with the photoelectric film and a conveyor conveying the photoelectric mask to a transfer chamber without exposing the mask to atmospheric air. CONSTITUTION:A reserve chamber 22 divided by a valve 24 up and down is connected to one side wall of a vacuum vessel 1 as the transfer chamber through a gate valve 21. The upper chamber of the chamber 22 is used as a mask reserve chamber 26, a lower chamber is used as a sample reserve chamber 25, a magazine 27 encasing a plurality of samples 3 is disposed in the chamber 25, and a magazine 28 encasing a plurality of the photoelectric masks 5 is disposed in the chamber 26. The coating chamber 34 is connected to the reserve chamber 22 through a valve 33, and the desired photoelectric surfaces are formed to the exposed surfaces of the samples 3 coated with the masks 5 by an evaporating mechanism 37 provided in the chamber 34. The samples 3 are transferred to the exfoliating chamber (not shown) without being exposed to air, and the samples 3 and the masks 5 are exfoliated in the exfoliating chamber.