OPTICAL SENSOR

PURPOSE:To manufacture easily a titled optical sensor, and also to obtain with a high accuracy an optional spectral sensitivity characteristic by layering and forming as one body a metallic film interference filter and a sharp cut filter on a photodetecting surface of a photoelectric element. CONSTITUTION:An optical sensor 1 is constituted of a photodetector 3 (a photodiode, a phototransistor, etc.) formed on a semiconductor substrate 2, a metallic film interference filter 4, which is layered on a photodetecting surface of this photodetector 3 and formed as one body continuously, and a sharp cut filter 5. In this regard, a formation as one body to the photodetector 3 of the metallic film interference filter 4, and a layered formation as one body to the metallic film interference filter 4 of the sharp cut filter 5 are executed by using a vacuum vapor depositing method. In this way, the optical sensor is manufactured easily, and also an optional spectral sensitivity characteristic is obtained with a high accuracy.