SUBSTRATE DRYING APPARATUS

PURPOSE:To improve the yield of a substrate drying apparatus at ultrafinely machining time by providing an impeller in the interior by a cup of a centrifugal blower type, thereby smoothing an air stream in the cup and removing adhered foreign material on a substrate at the substrate drying time. CON...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	HIROSE HIDEYUKI, TSUBOKA TOMOAKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HEATING LIGHTING MECHANICAL ENGINEERING SEMICONDUCTOR DEVICES WEAPONS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PURPOSE:To improve the yield of a substrate drying apparatus at ultrafinely machining time by providing an impeller in the interior by a cup of a centrifugal blower type, thereby smoothing an air stream in the cup and removing adhered foreign material on a substrate at the substrate drying time. CONSTITUTION:When a turntable 3 which is secured with an impeller 11 is rotated, air is introduced from an inlet 13 like a centrifugal blower. The, the air passes the surfaces of semiconductor wafers 1 contained in a cassette 2 as designated by an arrow to dry the wafer. When the air reach the inner periphery of the cup 4', the air stream alters to turning flow without disorder, and substantially completely exhausted externally from an outlet 4a'. Accordingly, since the jumping of a foreign material from the inner peripheray of the cup 4' is eliminated in the inside direction of the impeller 11, the wafer 1 which has clean surface can be obtained.