POSITIVE TYPE PHOTORESIST COMPOSITION

PURPOSE:To improve the adhesion of a positive type phtoresist compsn. to a substrate by adding the compd. obtd. by esterifying partially the addition surface of a conjugate diene polymer and alpha,beta-unsatd. dicarboxylic acid or the anhydride thereof to said compsn. CONSTITUTION:A compd. obtd. by...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	YASUI MASAAKI, HANABATAKE MAKOTO, FURUTA AKIHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE:To improve the adhesion of a positive type phtoresist compsn. to a substrate by adding the compd. obtd. by esterifying partially the addition surface of a conjugate diene polymer and alpha,beta-unsatd. dicarboxylic acid or the anhydride thereof to said compsn. CONSTITUTION:A compd. obtd. by bringing a compd. having an alcoholic hydroxyl group into reaction with the adduct of a conjugate diene polymer and alpha,beta- unsatd. dicarboxylic acid or the anhydride thereof is added to a positive type photoresist compsn. contg. a quinone diazide compd. as a photosensitive agent. Such positive type photoresist compsn. has high definition and adheres securely to a substrate without peeling. The compsn. lends itself not only to a large scale integrated circuit having, for example, about 1mum patterns but also to processing of a shadow mask, a color filter for CCD, printed wiring, PS flat plate, etc.