ZIRCONIUM OXIDE COMPOSITION FOR VAPOR DEPOSITION AND SPUTTERING AND PRODUCTION OF OPTICAL THIN FILM USING SAID COMPOSITION

PURPOSE:To suppress optical heterogeneity and to improve hardness by using a compsn. consisting of zorconium oxide as well as yttrium oxide and titanium oxide for an evaporating source or sputtering source. CONSTITUTION:A compsn. consisting of zirconium oxide, 0.5-50wt% yttrium oxide by the weight o...

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Hauptverfasser:	HIRASAWA KAZUO, SHIBATA TAKESHI, KATSUBE SHIZUKO, KATSUBE TAKAYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F DIFFUSION TREATMENT OF METALLIC MATERIAL GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PURPOSE:To suppress optical heterogeneity and to improve hardness by using a compsn. consisting of zorconium oxide as well as yttrium oxide and titanium oxide for an evaporating source or sputtering source. CONSTITUTION:A compsn. consisting of zirconium oxide, 0.5-50wt% yttrium oxide by the weight of said zirconium and 0.5-160wt% titanium oxide is used for an evaporating source or sputtering source and a thin film is formed on the surface of a base body by vacuum evaporation or sputtering.