VACUUM DEPOSITION DEVICE

PURPOSE:To enhance metal deposition efficiency to the surface of a supporter, and to reduce cost of the whole of a magnetic recording medium by a method wherein a member to obstruct the inflow of a molten metal to the beam irradiating part of a metal evaporation source is provided directly under the irradiating position thereof by shallowing depth of the molten metal at the part thereof. CONSTITUTION:An irradating part according to an electron beam 7 is heated up to the boiling point to generate a vapor current 8 extending in the width direction A of a film base 1. Therefore, an evaporating material 6 at the irradiating part is reduced to form a recessed part on the surface of the molten metal of the evaporating material 6. While, because the molten metal at the adjoining part to the irradiating part has higher viscosity as compared with the molten metal at the irradiating part, and moreover resistance at time when the molten metal flows to the irradiating part thereof from the adjoining part is enhanced because depth of the irradiating part is shallowed according to a projection 10, replenishment of the molten metal to the recessed part of the irradiating part thereof is delayed. Accordingly, in the steady state that the evaporating quantity of the evaporating material and the replenishing quantity thereof are equalized, the molten metal surface of the irradiating part of the electron beam 7 becomes to form a recessed surface.