PHOTOSENSITIVE COMPOSITION

PURPOSE:To obtain a relief image or a resist image having satisfactory film forming property and high strength by using a multicomponent polymer prepd. by reacting a specified compound with a copolymer contg. radical polymerizable carboxylic acid or its anhydride. CONSTITUTION:This photosensitive composition giving a resist image or a relief image when cured under irradiated light contains a multicomponent polymer as a principal component. The polymer is prepd. by reacting a compound represented by the formula (where X is -OH, -NH2 or -SH, R1 is H, alkyl or phenyl, each of R3 and R2 is H or lower alkyl, R2 and R3 may bond to each other to form a naphthalene ring together with the benzene ring, and (n) is an integer of 2-10) with a copolymer consisting of radical polymerizable unsatd. carboxylic acid or its anhydride and other monomer which is copolymerizable with said acid or its anhydride. The multicomponent polymer contains a photoactivator having a polyhalogenated methyl group for generating free radicals by the action of light. Maleic anhydride is preferably used as said carboxylic acid or its anhydride. The photosensitive composition causes no reaction in the dark and has a large difference in solubility in a solvent between the exposed and unexposed parts, so a clear image can be obtd. without requiring a dyeing stage.