DEFLECTION VOLTAGE GENERATOR FOR ELECTRON-BEAM LITHOGRAPHY APPARATUS

PURPOSE:To practically increase the line width thereby to improve the productivity, by vibrating an electron beam thereby to equivalently increase the electron-beam diameter in lithography. CONSTITUTION:An electron beam 12 emitted from an electron gun 11 passes through an anode 13, electron lenses 14, a blanking electrode 15 and a deflection electrode 16A and reaches a material 18 to be lithographed mounted on a stage 17 so as to draw a pattern on the material 18. When the beam 12 is deflected, a sine wave, for example, is superposed on the deflection voltage. More specifically, a fluctuating voltage of a frequency higher than the ON/OFF frequency of the electrode 15 is generated from a generator which generates, for example, a sine wave and is superposed on the deflection voltage through a superposing device such as an adder. Thus, the locus M of the center of the beam 12 is fluctuated, and the width of the line drawn by the beam 12 is increased correspondingly to the amplitude of the fluctuation, so that the diameter of the beam 12 is equivalently increased.