RADIATION-RESISTANT COMPOSITION

PURPOSE:To obtain titled composition resistant to high-dose radiation, by incorporating a specific fluoranthene compound in an unsaturated elastomer derived from ethylene and cyclopentadiene followed by a curing. CONSTITUTION:The objective composition can be obtained by incorporating (A) 100 parts b...

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Bibliographische Detailangaben
Hauptverfasser: YAGIYUU HIDEKI, OGURA JIROU
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To obtain titled composition resistant to high-dose radiation, by incorporating a specific fluoranthene compound in an unsaturated elastomer derived from ethylene and cyclopentadiene followed by a curing. CONSTITUTION:The objective composition can be obtained by incorporating (A) 100 parts by wt. of an unsaturated elastomer derived from ethylene and cyclopentadiene with (B) at least 100 and up to ca. 300 parts by wt. of a compound of formula (R is 1-4C alkyl; X is an integer : 1-4) (e.g. methyl fluoranthene, dimethyl fluoranthene), followed by carrying out a curing.