PREPARATION FOR PHTHALIC ANHYDRIDE OF HIGH PURITY
PURPOSE:To remove impurities efficiently and obtain the titled compound industrially and advantagenously, by bringing crude phthalic anhydride obtained by the catalytic vapor phase oxidation into contact with a gas containing oxygen in the presence of an alkali metallic salt of a carboxylic acid and...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | PURPOSE:To remove impurities efficiently and obtain the titled compound industrially and advantagenously, by bringing crude phthalic anhydride obtained by the catalytic vapor phase oxidation into contact with a gas containing oxygen in the presence of an alkali metallic salt of a carboxylic acid and an alloy composition containing Mn at a high temperature,and distilling the resultant mixture. CONSTITUTION:Crude phthalic anhydride prepared by the catalytic oxidation of o-xylene is treated with a gas containing molecular oxygen in the presence of one or more alkali metallic salts of carboxylic acids, e.g. maleic, succinic and benzoic acids, and an alloy composition containing Mn at a temperature as high as 150-300 deg.C for 0.5-30hr, and the resultant mixture is then distilled to give the aimed compound. Preferably, the gas containing the oxygen is brought into contact with one kg phthalic anhydride at >=1X10mol/hr flow rate expressed in terms of oxygen gas, and the alkali metallic salts are used in an amount of 10-10,000ppm (weight) expressed in terms of metallic atmos. The contact area of the alloy containing Mn is preferably >=1X10m . |
---|