SOLID-STATE IMAGE PICKUP ELEMENT

PURPOSE:To reduce the difference of utilizing factor of light per each color, to improve the utilizing factor of light and to obtain a desired light collecting effect, by providing uneven parts on the surface of a color filter pattern. CONSTITUTION:In this example, as shown in figure, >=1 light s...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HORIUCHI TSUNEHISA, IZUMI AKIYA, OOSHIBA SHIGERU, TANABE TATSUO
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:PURPOSE:To reduce the difference of utilizing factor of light per each color, to improve the utilizing factor of light and to obtain a desired light collecting effect, by providing uneven parts on the surface of a color filter pattern. CONSTITUTION:In this example, as shown in figure, >=1 light shield line not developing resist is provided in a square as a photomask pattern 11. Thus, uneveness is formed on the filter pattern cross section as shown in figure. Further, in using a positive resist, >=1 transmitting line is provided. In the example of the execution of invention, the desired light collecting effect is obtained. Moreover, in the photomask pattern, to improve the light utilizing factor, narrow light shield lines are provided for the negative filter material and narrow transmitting lines are provided for the positive type.