GENERATOR FOR ION BEAM

PURPOSE:To obtain ion beams of two kinds by one common device by preparing at least two kinds of ions in an ion source, alternately selecting these ions in proper pulse width in a mass separating section and introducing the ions in front of the mass separating section. CONSTITUTION:The deflection magnetic field type mass separating section 7 selecting predetermined ions is connected to an ion optical system path 6 communicated with the ion source 5, the beams 8 of said ions selected are obtained in front of the separating section 7, and the beams are worked onto a film and said ions are inplanted into the film. In this case, however, the mixed vapor of two kinds of V group elements such as As and P is introduced into the ion source 5 and each ion is acquired under a mixed state, and said mass separating section 7 is controlled by a control circuit 9 and changed over and controlled alternately in proper pulse width to a first state selecting one ions and a second state selecting the other ions at that time.