THIN FILM CIRCUIT DEVICE

PURPOSE:To make it possible to manufacture the device at a high yield rate, by coating thin film elements formed on the surface of a substrate by an insulating resin. CONSTITUTION:The thin film elements 2, 3, and 4 are formed on the surface of an insulating substrate 1, and a thin film conductor 4&#...

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1. Verfasser: FUJI MASAAKI
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To make it possible to manufacture the device at a high yield rate, by coating thin film elements formed on the surface of a substrate by an insulating resin. CONSTITUTION:The thin film elements 2, 3, and 4 are formed on the surface of an insulating substrate 1, and a thin film conductor 4' is formed on the back surface. Thereafter, a semiconductor chip and the like are attached. Then the circuits on the top and back surfaces of the substrate 1 are electrically connected, and the thin film elements 2, 3, and 4, a which are formed on the top surface of the substrate 1, are coated by the insulating resin 5. Thus the damage due to flaws and the like on the thin film elements in the attachment of the IC to the back surface of the substrate and the like can be prevented.