PHOTOSENSITIVE LAMINATE STRUCTURE

PURPOSE:To obtain an insoluble photoresist layer of good dimensional accuracy by forming the photoresist layer on a water soluble PVA film backing, and exposing said layer through the backing then dissolving away the backing with an aq. soln. CONSTITUTION:A film consisting basically of polyvinyl alc...

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Bibliographische Detailangaben
Hauptverfasser:	SHIMOMURA MOTOHIDE, MARUI TOSHIO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS
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Beschreibung
Zusammenfassung:	PURPOSE:To obtain an insoluble photoresist layer of good dimensional accuracy by forming the photoresist layer on a water soluble PVA film backing, and exposing said layer through the backing then dissolving away the backing with an aq. soln. CONSTITUTION:A film consisting basically of polyvinyl alcohol PVA of 500- 2,500 deg. of polymn. and 75-95% degrees of saponification dissoles well in water at 20 deg.C. A photoresist layer B is placed on the backing of such film A, and a film C is formed as a protecting film thereon, whereby a photosensitive laminate structure is obtained. After said layer is exposed through the transparent backing film A by using this, the film C is removed and the exposed layer B is adhered to a copper plate. When this is treated with an aq. developing soln. of 2% sodium carbonate, the backing is dissoled away, and only the exposed insoluble layer B remains, and the beautiful resist layer of good dimensional accuracy is obtained.