ELECTRON BEAM TRANSFER DEVICE

PURPOSE:To enable to replace a sample and a photoelectric mask without having an effect by the air by a method wherein an auxiliary chamber and a transfer chamber are connected through the intermediary of a gate valve. CONSTITUTION:The transfer chamber 1 is connected to the auxiliary chamber 21 thro...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TOUJIYOU TOORU, SHINOZAKI TOSHIAKI, SUGIHARA KAZUYOSHI, MORI ICHIROU
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:PURPOSE:To enable to replace a sample and a photoelectric mask without having an effect by the air by a method wherein an auxiliary chamber and a transfer chamber are connected through the intermediary of a gate valve. CONSTITUTION:The transfer chamber 1 is connected to the auxiliary chamber 21 through the intermediary of a gate valve 21, and the auxiliary chamber 22 is divided into a sample auxiliary chamber 31 and a mask auxiliary chamber 32 using a gate valve 30. When the sample 3 or the mask 5 located in the transfer chamber is replaced, the materials to be replaced in the transfer chamber and the auxiliary chamber are brought in the same height, the gate valve 21 is opened and they are replaced by driving a carrier arm 37. When the mask is replaced, the gate valve 30 is also opened.