CORRECTING DEVICE FOR PHOTO-MASK

PURPOSE:To correct a pattern rapidly with high accuracy by forming the correcting device so that beams can be passed under a condition that a rectangular slit is turned around on optical axis and irradiating rectangular beams inclined at a desired angle onto the mask. CONSTITUTION:The rectangular sl...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	KAWANABE TAKAO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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