CORRECTING DEVICE FOR PHOTO-MASK

PURPOSE:To correct a pattern rapidly with high accuracy by forming the correcting device so that beams can be passed under a condition that a rectangular slit is turned around on optical axis and irradiating rectangular beams inclined at a desired angle onto the mask. CONSTITUTION:The rectangular sl...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	KAWANABE TAKAO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE:To correct a pattern rapidly with high accuracy by forming the correcting device so that beams can be passed under a condition that a rectangular slit is turned around on optical axis and irradiating rectangular beams inclined at a desired angle onto the mask. CONSTITUTION:The rectangular slit 15 changing laser beams into rectangular luminous flux is mounted onto the passage of laser beams irradiated to the surface of the photo-mask 1 to be corrected. The slit 15 supports four slit plates 17a-17d mutually moved in the rectangular direction to an annular supporting ring 16. The slit plates 17a-17d are each engaged with the screw-shaped shafts 19a-19d of motors 18a-18d independently supported to the ring 16, and are movable fore and aft through the drive of the motors 18a-18d, and the predetermined rectangular slit is formed. The ring 16 is turned around a shaft at an arbitrary angle through the drive of a motor 22.