PHOTOSENSITIVE COMPOSITION

PURPOSE:To obtain a positive type photosensitive composition having superior developability and capable of being developed with water by blending a polymer contg. basic nitrogen atoms with a compound forming acid when irradiated with active light. CONSTITUTION:A photosensitive composition is obtd. b...

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Bibliographische Detailangaben
Hauptverfasser:	SASA NOBUMASA, KOGURE MOTOO, NOGAMI AKIRA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE:To obtain a positive type photosensitive composition having superior developability and capable of being developed with water by blending a polymer contg. basic nitrogen atoms with a compound forming acid when irradiated with active light. CONSTITUTION:A photosensitive composition is obtd. by blending 1pt.wt. of a polymer having 5,000-200,000mol.wt., contg. basic nitrogen and convertible into a water soluble polymer in the presence of acid, e.g., poly(styrene-co-N,N- dimethylaminomethacrylate) with 0.02-1.2pts.wt. of a compound forming acid by a chemical change when irradiated with active light, e.g., 1,2-naphthoquinone- 2-diazido-5-sulfonic acid-ethyl ester. The composition is applied to a support, exposed through a transparent original, and developed with water to obtain a positive type relief image. Thus, a superior relief image for lithography having effective properties as a resist is obtd.