HIGH FREQUENCY ION PLATING DEVICE
PURPOSE:To improve the adhesiveness of evaporating particles on glass substratas and to form good coating films by connecting the glass substrate which is rotating horizontally in a chamber to a cathode via a supporting frame, a fulcrum shaft and a rotary base plate. CONSTITUTION:In a chamber 1, a g...
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Sprache: | eng |
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Zusammenfassung: | PURPOSE:To improve the adhesiveness of evaporating particles on glass substratas and to form good coating films by connecting the glass substrate which is rotating horizontally in a chamber to a cathode via a supporting frame, a fulcrum shaft and a rotary base plate. CONSTITUTION:In a chamber 1, a glass substrate 12 is held by a fulcrum shaft 7 secured to a supporting frame 12a, and is rotated and moved in the direction parallel to the chamber 1 in said chamber by a planetary rotating mechanism consisting of a rotating gear 8 meshed with an internal gear 9, and a rotary base plate 4 rotating together with a revolving gear plate 3. The base plate 4 and the ring 9 are insulated respectively from the chamber 1 by insulators 5, 10, and the substrate 12 is connected to an anode via the frame 12a, the shaft 7, the plate 4, a brush 13, a lead wire 17 and a terminal 14, so that the evaporating particles generated from the anode side consisting of a vapor source 15 and a high frequency coil 18 are vapor-deposited efficiently on the glass substrate. |
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