THERMAL HEAD AND MANUFACTURE THEREOF

PURPOSE:To provide a thermal head with a high yield free from overetching, uneven resist coating and the like during the photolithography by forming a film of an electrode immediately beneath a protective layer thinner than other parts. CONSTITUTION:For example, after a sputtering of a tantalum nitr...

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Bibliographische Detailangaben
1. Verfasser:	TAKAMATSU YASUHIKO
Format:	Patent
Sprache:	eng
Schlagworte:	CORRECTION OF TYPOGRAPHICAL ERRORS ELECTRICITY i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME LINING MACHINES PERFORMING OPERATIONS PRINTING SELECTIVE PRINTING MECHANISMS STAMPS TRANSPORTING TYPEWRITERS
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Beschreibung
Zusammenfassung:	PURPOSE:To provide a thermal head with a high yield free from overetching, uneven resist coating and the like during the photolithography by forming a film of an electrode immediately beneath a protective layer thinner than other parts. CONSTITUTION:For example, after a sputtering of a tantalum nitride 2 on a ceramic substrate 1, nichrome 3 and gold 4 are deposited thereon and gold 5 is plated on the metals. The laminated electrode materials is etched by a photolithography to form heat generating resistances 6, 6..., electrodes 7, 7... and a common electrode 8. Then, a bonding section 7a of the electrodes 7 and the common electrode 8 are masked, a protective layer 9 comprising silicic oxide 10 and tantalum oxide 11 is formed by sputtering. Thereafter, gold 12 is plated thereon.