MANUFACTURE OF SEMICONDUCTOR DEVICE

PURPOSE:To increase a close tightness between a substrate and a photo resist and obtain a minute pattern by a small amount of organic solvent by a method wherein vapor of organic solvent has been sprayed against the substrate surface previously when a photo-sensitive film is formed on the semiconduc...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HASHIMOTO TADAHIRO, KOUNO HIROMICHI
Format: Patent
Sprache:eng
Schlagworte:
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