LOW-TEMPERATURE BAKING COATING COMPOSITION

PURPOSE:To provide the titled compsn. in which film performance is not lowerd even when baking is conducted at a low temperature, consisting of a specified acrylic resin, an etherified amine resin and a metallic drier. CONSTITUTION:5-30wt% dicyclopentadiene derivative of the formula (wherein R is H,...

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1. Verfasser: IWATOMO KEISUKE
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To provide the titled compsn. in which film performance is not lowerd even when baking is conducted at a low temperature, consisting of a specified acrylic resin, an etherified amine resin and a metallic drier. CONSTITUTION:5-30wt% dicyclopentadiene derivative of the formula (wherein R is H, lower alkyl, halogen; R' is a bivalent org. group; n is 0, 1), 5-30wt% monoethylenically unsaturated monomer having OH group such as 2-hydroxyethyl acrylate, 1-10wt% unsaturated carboxylic acid such as acrylic acid, and other copolymerizable monoethylenically unsaturated monomer such as styrene, are copolymerized in the presence of an azobis catalyst to produce an acrylic resin having a weight-average MW of 1,500 or more. Then 10-100pts.wt. amino resin etherified with a 1-4C mono-alcohol and 0.01-1pts.wt. (based on the amount of solid in said resin) metallic drier such as cobalt naphthenate are blended with 100pts.wt. above acrylic resin.