COATING METHOD AND APPARATUS BY UTILIZING ION FOR ELECTRICALLY NON-CONDUCTIVE SUBSTRATE

The present invention is directed to coating low-conductive or non-conductive materials in a vacuum, such as coating electrically-insulating substrates, by operating a plasma source comprising a thermionic cathode and anode with the anode-voltage continuously alternating between an ignition voltage...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	RIYUUDEIGERU UIRUBERUKU, BERUNTO BIYUTSUKEN, HERUMUUTO BORINGERU, DEIITOMAARU SHIYURUTSUE
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present invention is directed to coating low-conductive or non-conductive materials in a vacuum, such as coating electrically-insulating substrates, by operating a plasma source comprising a thermionic cathode and anode with the anode-voltage continuously alternating between an ignition voltage UZ and an extinction voltage UL at a frequency of between several kHz and several hundred kHz, the thermionic cathode continuously emitting electrons.