MANUFACTURE OF MULTIIVANE FAN WITH MONOLITHIC CONSTRUCTION

PURPOSE:To improve a deviation from cylindricity of a vane-cylinder and a ratio of sum total of vane's width to the circumferential length as well as to unify all processes such as open-cutting and vane forming after it.

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1. Verfasser: OCHIAI IZUMI
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To improve a deviation from cylindricity of a vane-cylinder and a ratio of sum total of vane's width to the circumferential length as well as to unify all processes such as open-cutting and vane forming after it.