SELECTIVE ETCHING METHOD

PURPOSE:To do selective etching of a pattern with certainty, good working and high accuracy by doing full face exposure from nearly the vertical direction.

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	ITOU MASANORI, MATSUMOTO ITOKU, ISHII KIYOUICHI, TAKAGI MIKIO, KAMIOKA HAJIME
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PURPOSE:To do selective etching of a pattern with certainty, good working and high accuracy by doing full face exposure from nearly the vertical direction.