METHOD AND APPARATUS FOR INSPECTING FLAW OF SHADOW MASK

PROBLEM TO BE SOLVED: To easily detect the flaws of a shadow mask, that is, the shape flaw and irregular/staining flaw thereof with high accuracy without relying on labor. SOLUTION: When a shadow mask 1 to be inspected is fixed on a base stand 2 to be irradiated with light from a light source 4 thro...

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Hauptverfasser:	KOBAYASHI TAKAYUKI, SAITO JUNICHI, MIHASHI MITSUSACHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CALCULATING COMPUTING COUNTING ELECTRIC COMMUNICATION TECHNIQUE ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY IMAGE DATA PROCESSING OR GENERATION, IN GENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS PICTORIAL COMMUNICATION, e.g. TELEVISION TESTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To easily detect the flaws of a shadow mask, that is, the shape flaw and irregular/staining flaw thereof with high accuracy without relying on labor. SOLUTION: When a shadow mask 1 to be inspected is fixed on a base stand 2 to be irradiated with light from a light source 4 through a diffusion plate 3, a CCD camera 6 takes the images of a large number of holes successively. The imaging signal formed by this CCD camera 6 is sent out to a processor 7. The processor 7 extracts the signal of the hole from the imaging signal. Further, a flaw is detected and judged by using the extracted hole signal in the processor 7. This flaw detecting/judging processing is executed with respect to all of the holes 11 formed to the shadow mask to complete the whole operation.