HEAT TREATMENT DEVICE FOR GLASS SUBSTRATE FOR LIQUID CRYSTAL DISPLAY

PROBLEM TO BE SOLVED: To provide a device in which the amount of dust generated is reduced to a lower level and the temp. distribution is uniformized. SOLUTION: This device 1 is provided with a plurality of hollow sections 4 each of which has an inlet 2 and an outlet 3 for a glass substrate 16 and which are vertically stacked up on a machine room 17, a hot plate(s) 5 for a temp. elevation section 7, a hot plate(s) 5 for a soaking section 8, a hot plate(s) 5 for a cooling section 9 and a cold plate(s) 21, all of which plates are placed in that order on the lower surface inside each of the hollow sections 4, in the direction from the inlet 2 to the outlet 3, and a single-substrate processing transfer mechanism for concurrently transferring a plurality of glass substrates 16 through the insides of the hollow sections 4 respectively while supporting the glass substrate 16 with a plurality of support metallic fixtures fitted to a transfer beam 12 in each of the hollow sections 4. In the device 1, shutters 24 each of which is opened at the time of performing the transfer of the substrates 16 and closed at the time of performing no transfer of the substrates 16 by a shutter driving system, are placed in openings for beam supports 15, that are formed in the machine room 17, respectively.