PRODUCTION OF CUBIC NITRIDED BORON COATING FILM

PROBLEM TO BE SOLVED: To produce the cubic nitrided boron coating film of high hardness on a substrate by generating an arc discharge with boron as a cathode, guiding a boron ion generated to an annular magnetic field of an electromagnetic coil and adhering on a substrate surface in presence of a ni...

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1. Verfasser: SOTOZAKI MINEHIRO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To produce the cubic nitrided boron coating film of high hardness on a substrate by generating an arc discharge with boron as a cathode, guiding a boron ion generated to an annular magnetic field of an electromagnetic coil and adhering on a substrate surface in presence of a nitrogen ion. SOLUTION: A boron cathode 11, in which C, Ca, etc., as impurities are added in =400 deg.C, preferably >=500 deg.C. Successively, an arc discharge is generated between a cathode 15 and an annular anode 17 through a trigger electrode 16. A boron ion 19 generated from the boron cathode 11, while separating a non charged fused material 20 from thereof, is guided to a substrate 21 through a deflection coil 22 and is allowed to reacted with the nitrogen gas on the surface, introduced from a supply pipe 24, a C-BN coating film excellent in wear resistance is adhered/ formed on a substrate surface.