FORMING METHOD FOR THICK FILM GLASS PATTERN

PROBLEM TO BE SOLVED: To three-dimensionally control a pattern shape, and finish it as in design dimension, in case of patterning a thick film glass layer by a sand blast method. SOLUTION: In a method for performing patterning of a thick film glass layer 4 by a sand blast method after a mask layer 5...

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Bibliographische Detailangaben
1. Verfasser:	KIMA YASUNORI
Format:	Patent
Sprache:	eng
Schlagworte:	ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY GRINDING MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS PERFORMING OPERATIONS POLISHING PRINTED CIRCUITS TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To three-dimensionally control a pattern shape, and finish it as in design dimension, in case of patterning a thick film glass layer by a sand blast method. SOLUTION: In a method for performing patterning of a thick film glass layer 4 by a sand blast method after a mask layer 5 having sand blast resistance is formed on the thick film glass layer 4 at least containing an inorganic glass powder and a resin binder formed on a base material 1, sand blast work is performed so that a sectional shape of the thick film glass layer 4 satisfies a condition of formulae: Wm×0.75