CHEMICAL VAPOR DEPOSITION TREATMENT

PROBLEM TO BE SOLVED: To provide a chemical vapor deposition treating method capable of increasing the conversion ratio from a vapor depositing raw material into a vapor depositing material and moreover uniformizing the vapor-deposited film to be formed on the surfaces of particles composing a granu...

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Bibliographische Detailangaben
Hauptverfasser:	IWANAGA KATSUSUKE, HARA YOICHIRO, UMENO TATSUO, HIRUTA TAKASHI, MATSUNAGA OSAMU, TSUNAWAKE TADANORI, FUKUDA KENJI
Format:	Patent
Sprache:	eng
Schlagworte:	CASTING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MAKING METALLIC POWDER MANUFACTURE OF ARTICLES FROM METALLIC POWDER METALLURGY PERFORMING OPERATIONS POWDER METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING WORKING METALLIC POWDER
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a chemical vapor deposition treating method capable of increasing the conversion ratio from a vapor depositing raw material into a vapor depositing material and moreover uniformizing the vapor-deposited film to be formed on the surfaces of particles composing a granular body. SOLUTION: In a chemical vapor deposition treating in which, in a reactor, a granular body is brought into contact with organic matter, furthermore, the organic matter is carbonized, and the surfaces of respective particles composing the granular body are coated with carbon thin films, gaseous organic matter or a gaseous mixture composed of gaseous organic matter and an inert gas is introduced from the lower part into the reactor, by which the granular body is subjected to chemical vapor deposition treatment in a fluidized state.