DUPLEX POLISHING MACHINE

PROBLEM TO BE SOLVED: To obtain a carrier for holding and rotating a work especially, in a machine for polishing both surfaces of a sheet shape work, in which extremely high flatness and parallelness are required especially, simultaneously. SOLUTION: In a both surfaces polishing machine rotating a c...

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Bibliographische Detailangaben
Hauptverfasser:	AMANO TAKESHI, KIYONO TOSHIHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To obtain a carrier for holding and rotating a work especially, in a machine for polishing both surfaces of a sheet shape work, in which extremely high flatness and parallelness are required especially, simultaneously. SOLUTION: In a both surfaces polishing machine rotating a carrier by a pin drive method, a pin is constituted by a pin shaft 10 and a free turnable collar 12 made of fine ceramics or a metal collar surface-coated by fine ceramics arranged on its outer periphery. Especially, the raw material of fine ceramics is at least one out of the compound with the surface roughness of 2.0 μm or less consisting of aluminium oxide, chrome oxide, zirconium oxide, aluminium nitride, boron nitride, silicon nitride, silicon carbide, tungsten carbide, titanium carbide and titanium boride.