SURFACE TREATMENT OF STAMPER FOR OPTICAL DISK
PROBLEM TO BE SOLVED: To enhance productivity and to facilitate the maintenance and management of a treatment system by supplying a oxidation treating liquid to a stamper surface to execute an oxidation treatment for a prescribed time, rotating the stamper and supplying washing water to wash the sta...
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| creator | KUWANA MINORU |
| description | PROBLEM TO BE SOLVED: To enhance productivity and to facilitate the maintenance and management of a treatment system by supplying a oxidation treating liquid to a stamper surface to execute an oxidation treatment for a prescribed time, rotating the stamper and supplying washing water to wash the stamper, thereby efficiently executing the oxidation treatment and washing. SOLUTION: The inner peripheral hole of the stamper 1 is inserted into the central projection 2a of a turntable 2 and the stamper 1 is set horizontally on the turntable 2. A prescribed amt. of the oxidation treating liquid is supplied to the surface of the stamper 1 through the nozzle of an oxidation treating liquid supply pipe 5 from an oxidation treating liquid vessel 4 and is held for a specified time, by which the surface of the stamper 1 is subjected to the oxidation treatment. The stamper 1 is subjected, after the oxidation treatment, to shaking off and removing of the oxidation treating liquid on the surface with centrifugal force by rotating the turntable 2 with a drive source 3 and the washing water is supplied from a washing water supply pipe 6 to wash the surface of the stamper 1. The oxidation treating liquid is preferably an aq. soln. of hydrogen peroxide in terms of corrosiveness. As a result, there is no fluctuation in the concn. of the oxidation treating liquid and the occurrence of defective articles is drastically reduced. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPH11246990A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPH11246990A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPH11246990A3</originalsourceid><addsrcrecordid>eNrjZNANDg1yc3R2VQgJcnUM8XX1C1Hwd1MIDnH0DXANUnDzD1LwDwjxdHb0UXDxDPbmYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxXgEehoZGJmaWlgaOxsSoAQC_ViWi</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SURFACE TREATMENT OF STAMPER FOR OPTICAL DISK</title><source>esp@cenet</source><creator>KUWANA MINORU</creator><creatorcontrib>KUWANA MINORU</creatorcontrib><description>PROBLEM TO BE SOLVED: To enhance productivity and to facilitate the maintenance and management of a treatment system by supplying a oxidation treating liquid to a stamper surface to execute an oxidation treatment for a prescribed time, rotating the stamper and supplying washing water to wash the stamper, thereby efficiently executing the oxidation treatment and washing. SOLUTION: The inner peripheral hole of the stamper 1 is inserted into the central projection 2a of a turntable 2 and the stamper 1 is set horizontally on the turntable 2. A prescribed amt. of the oxidation treating liquid is supplied to the surface of the stamper 1 through the nozzle of an oxidation treating liquid supply pipe 5 from an oxidation treating liquid vessel 4 and is held for a specified time, by which the surface of the stamper 1 is subjected to the oxidation treatment. The stamper 1 is subjected, after the oxidation treatment, to shaking off and removing of the oxidation treating liquid on the surface with centrifugal force by rotating the turntable 2 with a drive source 3 and the washing water is supplied from a washing water supply pipe 6 to wash the surface of the stamper 1. The oxidation treating liquid is preferably an aq. soln. of hydrogen peroxide in terms of corrosiveness. As a result, there is no fluctuation in the concn. of the oxidation treating liquid and the occurrence of defective articles is drastically reduced.</description><edition>6</edition><language>eng</language><subject>APPARATUS THEREFOR ; CHEMISTRY ; ELECTROFORMING ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; INFORMATION STORAGE ; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER ; METALLURGY ; PHYSICS ; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><creationdate>1999</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990914&DB=EPODOC&CC=JP&NR=H11246990A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19990914&DB=EPODOC&CC=JP&NR=H11246990A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KUWANA MINORU</creatorcontrib><title>SURFACE TREATMENT OF STAMPER FOR OPTICAL DISK</title><description>PROBLEM TO BE SOLVED: To enhance productivity and to facilitate the maintenance and management of a treatment system by supplying a oxidation treating liquid to a stamper surface to execute an oxidation treatment for a prescribed time, rotating the stamper and supplying washing water to wash the stamper, thereby efficiently executing the oxidation treatment and washing. SOLUTION: The inner peripheral hole of the stamper 1 is inserted into the central projection 2a of a turntable 2 and the stamper 1 is set horizontally on the turntable 2. A prescribed amt. of the oxidation treating liquid is supplied to the surface of the stamper 1 through the nozzle of an oxidation treating liquid supply pipe 5 from an oxidation treating liquid vessel 4 and is held for a specified time, by which the surface of the stamper 1 is subjected to the oxidation treatment. The stamper 1 is subjected, after the oxidation treatment, to shaking off and removing of the oxidation treating liquid on the surface with centrifugal force by rotating the turntable 2 with a drive source 3 and the washing water is supplied from a washing water supply pipe 6 to wash the surface of the stamper 1. The oxidation treating liquid is preferably an aq. soln. of hydrogen peroxide in terms of corrosiveness. As a result, there is no fluctuation in the concn. of the oxidation treating liquid and the occurrence of defective articles is drastically reduced.</description><subject>APPARATUS THEREFOR</subject><subject>CHEMISTRY</subject><subject>ELECTROFORMING</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>INFORMATION STORAGE</subject><subject>INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER</subject><subject>METALLURGY</subject><subject>PHYSICS</subject><subject>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1999</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNANDg1yc3R2VQgJcnUM8XX1C1Hwd1MIDnH0DXANUnDzD1LwDwjxdHb0UXDxDPbmYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxXgEehoZGJmaWlgaOxsSoAQC_ViWi</recordid><startdate>19990914</startdate><enddate>19990914</enddate><creator>KUWANA MINORU</creator><scope>EVB</scope></search><sort><creationdate>19990914</creationdate><title>SURFACE TREATMENT OF STAMPER FOR OPTICAL DISK</title><author>KUWANA MINORU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH11246990A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1999</creationdate><topic>APPARATUS THEREFOR</topic><topic>CHEMISTRY</topic><topic>ELECTROFORMING</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>INFORMATION STORAGE</topic><topic>INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER</topic><topic>METALLURGY</topic><topic>PHYSICS</topic><topic>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</topic><toplevel>online_resources</toplevel><creatorcontrib>KUWANA MINORU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KUWANA MINORU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SURFACE TREATMENT OF STAMPER FOR OPTICAL DISK</title><date>1999-09-14</date><risdate>1999</risdate><abstract>PROBLEM TO BE SOLVED: To enhance productivity and to facilitate the maintenance and management of a treatment system by supplying a oxidation treating liquid to a stamper surface to execute an oxidation treatment for a prescribed time, rotating the stamper and supplying washing water to wash the stamper, thereby efficiently executing the oxidation treatment and washing. SOLUTION: The inner peripheral hole of the stamper 1 is inserted into the central projection 2a of a turntable 2 and the stamper 1 is set horizontally on the turntable 2. A prescribed amt. of the oxidation treating liquid is supplied to the surface of the stamper 1 through the nozzle of an oxidation treating liquid supply pipe 5 from an oxidation treating liquid vessel 4 and is held for a specified time, by which the surface of the stamper 1 is subjected to the oxidation treatment. The stamper 1 is subjected, after the oxidation treatment, to shaking off and removing of the oxidation treating liquid on the surface with centrifugal force by rotating the turntable 2 with a drive source 3 and the washing water is supplied from a washing water supply pipe 6 to wash the surface of the stamper 1. The oxidation treating liquid is preferably an aq. soln. of hydrogen peroxide in terms of corrosiveness. As a result, there is no fluctuation in the concn. of the oxidation treating liquid and the occurrence of defective articles is drastically reduced.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER METALLURGY PHYSICS PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS |
| title | SURFACE TREATMENT OF STAMPER FOR OPTICAL DISK |
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