STRONTIUM SOURCE MATERIAL FOR CVD AND METHOD OF FILM FORMATION USING THE SAME

PROBLEM TO BE SOLVED: To produce a high quality thin film with excellent workability by obtaining a raw material compound capable of vaporizing in liquid state at the time of producing the thin film of strontium or a strontium-containing material useful for a super conductive material or a ferromagn...

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Hauptverfasser:	TAZAKI YUZO, SATO MAMORU
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY ORGANIC CHEMISTRY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To produce a high quality thin film with excellent workability by obtaining a raw material compound capable of vaporizing in liquid state at the time of producing the thin film of strontium or a strontium-containing material useful for a super conductive material or a ferromagnetic material by CVD method. SOLUTION: The strontium source material, for CVD method is used for depositing strontium or the strontium-containing material by CVD method and is composed of an organic strontium complex using 2,2,6,6-tetramethyl-3,5- nonanedion as a ligand of strontium and expressed by the formula.