SURFACE POLISHING DEVICE WITH WORK FLUID REMOVING MECHANISM AND WORK FLUID REMOVING METHOD

PROBLEM TO BE SOLVED: To enable a work fluid of polishing fluid, rinse fluid, etc., left on a work surface of a surface plate to be removed easily and automatically. SOLUTION: A suction water head 17 of a work fluid removing mechanism 6 set up in a surface polishing device is connected to a suction...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	HAKOMORI SHIYUNJI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS DRESSING OR CONDITIONING OF ABRADING SURFACES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING SEMICONDUCTOR DEVICES TRANSPORTING
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