METHOD AND APPARATUS FOR CLEANING SEMICONDUCTOR WAFER

PROBLEM TO BE SOLVED: To improve cleaning effects for a group of semiconductor wafers. SOLUTION: An apparatus for cleaning a series of semiconductor wafers in which a group of semiconductor wafers obtained by cutting a semiconductor ingot by a wafer slicer are dipped in a cleaning liquid 5 in a clea...

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Bibliographische Detailangaben
Hauptverfasser:	NISHIDA NOBUO, YOSHIDA SHUNZO, KANAYAMA TADASHI, MURATSUBAKI RYOJI, TAKIMAE MASANORI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOTDIRECTED TO A PARTICULAR RESULT DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g.ARRANGEMENTS FOR COPYING OR CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS MACHINE TOOLS MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OFPARTICULAR DETAILS OR COMPONENTS METAL-WORKING NOT OTHERWISE PROVIDED FOR PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To improve cleaning effects for a group of semiconductor wafers. SOLUTION: An apparatus for cleaning a series of semiconductor wafers in which a group of semiconductor wafers obtained by cutting a semiconductor ingot by a wafer slicer are dipped in a cleaning liquid 5 in a cleaning chamber 1 has a pressure chamber 3 for supplying the cleaning liquid to the cleaning chamber 1 and pressurizing and depressurizing means 7, 9 for supplying alternately pressurized gas to the pressure chamber 3 or exhausting the pressurized gas from the pressure chamber 3 to raise or lower the level of the cleaning liquid.