GAS/LIQUID REACTION DEVICE
PROBLEM TO BE SOLVED: To enable a gas/liquid reaction to be performed at a high efficiency rate by setting the degree of opening of gas ascent holes formed in each of perforated plates in such a manner that the thickness of a gas phase formed on the lower face side of each of the perforated plates i...
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Sprache: | eng |
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Zusammenfassung: | PROBLEM TO BE SOLVED: To enable a gas/liquid reaction to be performed at a high efficiency rate by setting the degree of opening of gas ascent holes formed in each of perforated plates in such a manner that the thickness of a gas phase formed on the lower face side of each of the perforated plates is almost constant, in the gas/liquid reaction device with the perforated plates arranged at an interval in a reaction column. SOLUTION: Liquid is supplied into a reaction column 2 through a liquid supply pipe 12, and on the other hand, gas is supplied into an ejector 28 through a gas supply pipe 32 and is extracted from the lower end part of the reaction column 2 with the help of a circulating pump 26. Further, the gas is supplied into the reaction column 2, entrained by the liquid to be returned to the lower end part of the reaction column 2 again through the ejector 28. The reaction column 2 comprises plural perforated plates 40, arranged in a main part 4, each of which is packed with a plurality fillers. In addition, each of the perforated plates 40 has a plurality of gas ascent holes formed and in this case, the degree of opening of each of the gas ascent holes is set so that the thickness of the gas phase formed on the lower face side of each of the perforated plates 40 is almost constant, that is, 0.3-15% of the inner diameter of the main part 4. |
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