METHOD FOR FORMING PATTERN

PROBLEM TO BE SOLVED: To provide a pattern forming method for forming a resist pattern of a satisfactory profile on a reflection preventing film, by preventing generation of a void a reflection preventing film phenol resin is heated at a high temperature. SOLUTION: A method includes a process for fo...

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Bibliographische Detailangaben
Hauptverfasser:	ONISHI KIYONOBU, SATO YASUHIKO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a pattern forming method for forming a resist pattern of a satisfactory profile on a reflection preventing film, by preventing generation of a void a reflection preventing film phenol resin is heated at a high temperature. SOLUTION: A method includes a process for forming a reflection preventing film 2 including phenol system resin and a compound acting as plastic agent on embedded agent or the phenol system resin, process for heating a reflection preventing film 2 and making dense the reflection preventing film 2, and process for forming a resist pattern 8 on the dense reflection preventing film.