PARTICLE SAMPLING APPARATUS AND ITS DRIVING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM BY APPLICATION OF THIS

PROBLEM TO BE SOLVED: To increase the reliability of analysis by controlling respective air valves, separating values, pumps, etc., between each of purge lines and by-pass lines, and a sampling line containing a particle sampler and a pump. SOLUTION: In a sampling line, a sampling port 24, a fourth...

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Bibliographische Detailangaben
Hauptverfasser: BOKU KITEI, KYO SEITETSU, SAI HYAKUJUN, KIN CHINSEI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To increase the reliability of analysis by controlling respective air valves, separating values, pumps, etc., between each of purge lines and by-pass lines, and a sampling line containing a particle sampler and a pump. SOLUTION: In a sampling line, a sampling port 24, a fourth air valve 34d, a particle sampler 10, a separating valve 22, a rotary pump 20, an exhaust port 28 are linked wish pipes successively. A purge line is branched after passing a second air valve 34b from a purge gas supplying source 26b, and one is linked between the fourth air valve 34d and the particle sampler 10 through a third air valve 34c, and the other is linked between the separating valve 22 and the pump 20 through a first air valve 34a. The by-pass line is linked to the front and rear ends of the separating valve 22, and comprises a fifth air value 34e. A control unit controls the operation of the first and fifth air valves 34a-34e, the separating valve 22, and the pump 20. Consequently, it becomes possible to increase the reliability of particle analysis.