CHEMICAL VAPOR DEPOSITION FILM-FORMING DEVICE

PROBLEM TO BE SOLVED: To provide a device for forming a CVD film whose thickness and quality over the entirety thereof, specifically at the periphery and at the central portion of a wafer, are uniform. SOLUTION: There is provided with a device for forming a film by chemical vapor deposition, compris...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	NOHAMA SHIYOUJI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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