GYRO SENSOR

PROBLEM TO BE SOLVED: To obtain a vibration system gyro sensor of high detection sensitivity, by preparing a substrate on which a vibration beam is formed and an electrostatically driving substrate on which a thin insulating film for vibrating the beam in the thickness direction is formed, and forming a lamination structure by bonding the substrates. SOLUTION: This gyro sensor comprises mainly an electrostatically driving substrate 1 and a silicon substrate 2 on which a vibration beam is formed. The substrates are mutually bonded and form a vibration system gyro sensor, whose size and thickness are about 8×16 mm and about 1 mm, respectively. A thin film electrode to which a voltage is to be applied is formed on the electrostatically driving substrate 1. When a voltage having a frequency is applied to the electrode, a vibrator 3 of a both ends supported Si beam which is formed on the silicon substrate 2 and has a trench vibrates in the thickness direction of the substrate by an electrostatic force. On the electrostatically driving substrate 1, an insulating film 10 is formed which prevents short-circuit between the silicon substrate 2 and the thin film electrode of the electrostatically driving substrate 1.