PATTERN FORMING MATERIAL AND FORMATION OF PATTERN USING THE SAME

PROBLEM TO BE SOLVED: To improve the dimensional accuracy at the formation pattern by containing an alkali soluble high polymer, a tertiary alcohol having hydroxide group on carbons directly bonded to an aromatic ring, an acid precursor generating an acid by the irradiation with radial ray and a spe...

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Hauptverfasser:	SAKAMIZU TOSHIO, ARAI TADASHI, UTAKA SONOKO, UCHINO MASAICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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